Process flow chart of pure water treatment system - water purification
Figure 1 The commonly used primary RO+ secondary EDI+MB electronic I-level ultrapure water system process configuration diagram is suitable for source water with high hardness, high organic content, high electrical conductivity (less than 1000μs/cm), and the required water resistivity 18～ 18.2MΩ·cm ultrapure water system Figure 2 The commonly used primary RO + secondary EDI electronic Ⅱ level ultrapure water system process configuration diagram is suitable for the source water with high hardness, high organic content, electrical conductivity (less than 1000μs/cm), requirements Ultrapure water system with produced water resistivity of 15-18MΩ·cmFig. 5 Commonly used primary RO + secondary EDI electronics + MB electronics I-level ultrapure water system process configuration diagram It is suitable for source water with low hardness, low organic content, and electrical conductivity High (less than 1000μs/cm) ultrapure water system with a water resistivity of 18-18.2MΩ·cmFig. 6 Process configuration diagram of a commonly used first-level RO + second-level EDI electronic II-level ultrapure water system is suitable for low source water hardness , low organic content, high electrical conductivity (less than 1000μs/cm), and ultrapure water system that requires a water resistivity of 15-18MΩ·cm Figure 7. The composition diagram of the commonly used secondary RO+ primary EDI+MB electronic primary ultrapure water system with stable water quality is suitable for the source water with low hardness, high organic content and electrical conductivity.
In clean area management and quality control, laminar flow interference testing has received much attention, and whether it is only applicable to Class A laminar flow remains to be considered.