Process flow chart of pure water treatment system - water purification

Figure 1 The commonly used primary RO+ secondary EDI+MB electronic I-level ultrapure water system process configuration diagram is suitable for source water with high hardness, high organic content, high electrical conductivity (less than 1000μs/cm), and the required water resistivity 18～ 18.2MΩ·cm ultrapure water system Figure 2 The commonly used primary RO + secondary EDI electronic Ⅱ level ultrapure water system process configuration diagram is suitable for the source water with high hardness, high organic content, electrical conductivity (less than 1000μs/cm), requirements Ultrapure water system with produced water resistivity of 15-18MΩ·cmFig. 5 Commonly used primary RO + secondary EDI electronics + MB electronics I-level ultrapure water system process configuration diagram It is suitable for source water with low hardness, low organic content, and electrical conductivity High (less than 1000μs/cm) ultrapure water system with a water resistivity of 18-18.2MΩ·cmFig. 6 Process configuration diagram of a commonly used first-level RO + second-level EDI electronic II-level ultrapure water system is suitable for low source water hardness , low organic content, high electrical conductivity (less than 1000μs/cm), and ultrapure water system that requires a water resistivity of 15-18MΩ·cm Figure 7. The composition diagram of the commonly used secondary RO+ primary EDI+MB electronic primary ultrapure water system with stable water quality is suitable for the source water with low hardness, high organic content and electrical conductivity.